Precise structural investigation of symmetric diblock copolymer thin films with resonant soft X-ray reflectivity

Link:
Autor/in:
Erscheinungsjahr:
2013
Medientyp:
Text
Schlagworte:
  • Block copolymers
  • Self assembly
  • Vapor annealing
  • Block Copolymers
  • Micelles
  • Polymers
  • Block copolymers
  • Self assembly
  • Vapor annealing
  • Block Copolymers
  • Micelles
  • Polymers
Beschreibung:
  • Symmetric diblock copolymers are known to formlamellar structures in the bulk of an organic thin film. Polymer/polymer and polymer/substrate interfaces play a critical role in this application. Here, we report the investigation of multiple buried interfaces by using a novel technique resonant soft X-ray reflectivity which benefits from enhanced contrast between different polymers near the carbon K-edge. This allows us to obtain a precise interface structure. We also present an alternative method to determine optical constants of polymers by fitting X-ray reflectivity of polymers with known structural parameters at specific soft X-ray energies. This approach is compared with the way of obtaining beta by NEXAFS and calculating delta via the Kramers-Kronig relationship. Finally, by using the determined index of refraction, the precise structure of a multilayer formed by a diblock copolymer is obtained by successfully fitting the resonant soft X-ray reflectivity profile.
Lizenz:
  • info:eu-repo/semantics/restrictedAccess
Quellsystem:
Forschungsinformationssystem der UHH

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Quelldatensatz
oai:www.edit.fis.uni-hamburg.de:publications/974e138f-9b7d-44ab-8aff-6c62f2bfc5ba