Deposition of topological insulator Sb2Te3 films by an MOCVD process

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Erscheinungsjahr:
2014
Medientyp:
Text
Schlagworte:
  • Thermoelectricity
  • Thermoelectric equipment
  • Bismuth telluride
  • Thermoelectric Equipment
  • Thermal Conductivity
  • Thermoelectricity
  • Thermoelectric equipment
  • Bismuth telluride
  • Thermoelectric Equipment
  • Thermal Conductivity
Beschreibung:
  • Layered Sb2Te3 films were grown by a MOCVD process on Al2O3(0001) substrates at 400 degrees C by use of i-Pr3Sb and Et2Te2 and characterized by SEM, AFM, XRD, EDX and Auger spectroscopy. The electrical sheet resistivity was measured in the range of 4 to 400 K, showing a monotonic increase with increasing temperature. The valence band structure probed by angle-resolved photoemission shows the detailed dispersions of the bulk valence band and the topological surface state of a quality no less than for optimized bulk single crystals. The surface state dispersion gives a Dirac point roughly 30 meV above the Fermi level leading to hole doping and the presence of bulk valence states at the Fermi energy.
Lizenz:
  • info:eu-repo/semantics/restrictedAccess
Quellsystem:
Forschungsinformationssystem der UHH

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oai:www.edit.fis.uni-hamburg.de:publications/562d9d98-0c33-4743-bee9-f2874fc4214b